发明名称 SYNTHETIC ANTIFERROMAGNET STRUCTURES FOR USE IN MTJS IN MRAM TECHNOLOGY
摘要 <p>A magnetic tunnel junction (MTJ), which is useful in magnetoresistive random access memories (MRAMs), has a free layer which is a synthetic antiferromagnet (SAF) structure. This SAF is composed of two ferromagnetic layers that are separated by a coupling layer. The coupling layer has a base material that is non-magnetic and also other materials that improve thermal endurance, control of the coupling strength of the SAF, and magnetoresistance ratio (MR). The preferred base material is ruthenium and the preferred other material is tantalum. Furthering these benefits, cobalt-iron is added at the interface between the tantalum and one of the ferromagnetic layers. Also the coupling layer can have even more layers and the materials used can vary. Also the coupling layer itself can be an alloy.</p>
申请公布号 EP1697996(A2) 申请公布日期 2006.09.06
申请号 EP20040810475 申请日期 2004.11.04
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 PIETAMBARAM, SRINIVAS V.;DAVE, RENU W.;SLAUGHTER, JON M.;SUN, JIJUN
分类号 H01L29/76;G11C11/16;H01L31/113;H01L43/08 主分类号 H01L29/76
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