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发明名称
METHOD OF MAKING POLY SILICON LAYER
摘要
申请公布号
KR100618680(B1)
申请公布日期
2006.09.06
申请号
KR20000029764
申请日期
2000.05.31
申请人
发明人
分类号
H01L21/8234
主分类号
H01L21/8234
代理机构
代理人
主权项
地址
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