发明名称 Method of forming a film of predetermined pattern on a surface as well as device manufactured by employing the same, and method of manufacturing device
摘要 An object is to provide a mask formation method, which can curtail a manufacturing cost. A method of forming a film of predetermined pattern on the front surface of a member to-be-processed is so constructed as to carry out the step (S 178 ) of improving the adherence of a pattern material solution to the member to-be-processed, the step (S 180 ) of filling up a pattern forming recess provided in a mask on the surface of the member to-be-processed with a pattern material solution, the step (S 186 ) of improving the film quality of the pattern film to-be-formed by processing the pattern material solution, the step (S 188 ) of removing the pattern material solution having adhered on the mask, the step (S 190 ) of drying the pattern material solution, and the step (S 196 ) of subjecting the pattern film to annealing processing.
申请公布号 US7098121(B2) 申请公布日期 2006.08.29
申请号 US20030367854 申请日期 2003.02.19
申请人 SEIKO EPSON CORPORATION 发明人 MORI YOSHIAKI;MIYAKAWA TAKUYA;SATO MITSURU;ASUKE SHINTARO;TAKAGI KENICHI
分类号 G02F1/13;H01L21/22;G03F7/00;H01L21/027;H01L21/288;H01L21/31;H01L21/312;H01L21/3205;H01L21/4763;H01L21/768;H01L21/77;H01L21/84;H01L27/12 主分类号 G02F1/13
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