发明名称 Magnetic tunnel junction element structures and methods for fabricating the same
摘要 Magnetic tunnel junction ("MTJ") element structures and methods for fabricating MTJ element structures are provided. An MTJ element structure may comprise a crystalline pinned layer, an amorphous fixed layer, and a coupling layer disposed between the crystalline pinned layer and the amorphous fixed layer. The amorphous fixed layer is antiferromagnetically coupled to the crystalline pinned layer. The MTJ element further comprises a free layer and a tunnel barrier layer disposed between the amorphous fixed layer and the free layer. Another MTJ element structure may comprise a pinned layer, a fixed layer and a non-magnetic coupling layer disposed therebetween. A tunnel barrier layer is disposed between the fixed layer and a free layer. An interface layer is disposed adjacent the tunnel barrier layer and a layer of amorphous material. The first interface layer comprises a material having a spin polarization that is higher than that of the amorphous material.
申请公布号 US7098495(B2) 申请公布日期 2006.08.29
申请号 US20040899610 申请日期 2004.07.26
申请人 FREESCALE SEMICONDUCOR, INC. 发明人 SUN JIJUN;DAVE RENU W.;SLAUGHTER JON M.;AKERMAN JOHAN
分类号 H01L29/76 主分类号 H01L29/76
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