| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology capable of suppressing the number of heating units performing the heating treatment of a substrate after exposure, while securing a high throughput in a coating and developing apparatus for making the post-exposure lapsed time from the exposure of the substrate to the start of heating treatment constant. SOLUTION: By laminating unit blocks for forming coating films and unit blocks for developing process each other, a conveying means conveying between units for forming resist films is made independent from a conveying means conveying between units for performing developing process. After the exposed substrate is delivered to a delivery stage from the conveying means in an interface block, the timing of receiving the substrate by the conveying means in the unit block for developing process is adjusted in such a manner that the time from the exposure of the substrate to carrying it into the heating unit becomes a preset time. COPYRIGHT: (C)2006,JPO&NCIPI
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