| 摘要 |
PROBLEM TO BE SOLVED: To provide a wet developing device which carries out a processing treatment using a developing solution and is capable of quicky detecting troubles, such as photoresist left unprocessed on a substrate, over-development or under-development, over-rinsing or under-rinsing, etc., so as to prevent the substrates influenced by process troubles in a developing process from being introduced into a following process. SOLUTION: When a developing solution discharged out from a developing solution feed nozzle and a rinsing solution discharged out from a rinsing solution feed nozzle are discharged out in this sequence in a processing tank in a developing process, a processing solution is exhausted constantly through a drainage pipe provided in the processing tank in the processing device. Two or more pH measuring units are installed inside the drainage pipe, one of the pH measuring units is provided at an upper position in the drainage pipe near the processing tank, the other of the pH measuring units is provided at a lower position in the drainage pipe, the processing solution flowing through the drainage pipe is detected by the pH measuring units, and the developing state of the substrate is controlled by the comparison of the detected measured values. COPYRIGHT: (C)2006,JPO&NCIPI |
