Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method

摘要

An exposure apparatus including an illumination optical unit for irradiating exposure light, a stage for mounting a substrate and moving the substrate, a driving unit for driving the stage, a heater for applying heat to the stage, and a heat generation amount control unit for controlling heat generation amount to suppress a temperature change of the stage before or after driving of the driving unit or a temperature change of the stage before or after irradiating of the illumination optical unit.