发明名称 Solid-state imaging device and method of manufacturing said solid-state imaging device
摘要 It is an object to provide solid-state imaging device, which can easily be manufactured and has a high reliability, and a method of manufacturing the solid-state imaging device. In the present invention, a manufacturing method comprises the steps of forming a plurality of IT-CCDs on a surface of a semiconductor substrate, bonding a translucent member to the surface of the semiconductor substrate in order to have a gap opposite to each light receiving region of the IT-CCD, and isolating a bonded member obtained at the bonding step for each of the IT-CCDs.
申请公布号 US2006186499(A1) 申请公布日期 2006.08.24
申请号 US20060404898 申请日期 2006.04.17
申请人 MAEDA HIROSHI;NISHIDA KAZUHIRO;NEGISHI YOSHIHISA;HOSAKA SHUNICHI 发明人 MAEDA HIROSHI;NISHIDA KAZUHIRO;NEGISHI YOSHIHISA;HOSAKA SHUNICHI
分类号 H01L31/0232;H01L21/00;H01L27/148;H01L31/0203 主分类号 H01L31/0232
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