发明名称 |
Cleaning step in supercritical processing |
摘要 |
An apparatus for removing a residue from a surface of an object located on a support region within a processing chamber is disclosed. The apparatus comprises means for performing a dual-pressure cleaning process and means for performing a rinsing process. The means for performing a dual-pressure cleaning process comprises: means for pressurizing the processing chamber to a first pressure; means for introducing a cleaning chemistry into the processing chamber; means for recirculating the cleaning chemistry within the processing chamber for a first period of time; means for increasing a pressure of the processing chamber to a second pressure; and means for recirculating the cleaning chemistry within the processing chamber for a second period of time.
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申请公布号 |
US2006185693(A1) |
申请公布日期 |
2006.08.24 |
申请号 |
US20050065377 |
申请日期 |
2005.02.23 |
申请人 |
BROWN RICHARD;HILLMAN JOSEPH |
发明人 |
BROWN RICHARD;HILLMAN JOSEPH |
分类号 |
B08B7/04;B08B3/00;B08B3/12 |
主分类号 |
B08B7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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