摘要 |
<p>A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.</p> |
申请人 |
RICOH COMPANY, LTD.;SATO, SHUNICHI;JIKUTANI, NAOTO;ITOH, AKIHIRO;UMEMOTO, SHINYA;ZENNO, YOSHIAKI;YAMAMOTO, TAKATOSHI |
发明人 |
SATO, SHUNICHI;JIKUTANI, NAOTO;ITOH, AKIHIRO;UMEMOTO, SHINYA;ZENNO, YOSHIAKI;YAMAMOTO, TAKATOSHI |