发明名称 METHOD FOR MANUFACTURING SOLID-BODIED PHOTO-GALVANIC ELEMENT WITH p-i-n STRUCTURE
摘要 FIELD: optical electronics, in particular, engineering of devices, transforming beam energy to electrical energy, possible use for measuring light level, intensiveness of radiation, dose of ultraviolet radiation in agro-industrial complex and as sensor for determining concentration of ozone in atmospheric layer of Earth. ^ SUBSTANCE: method includes applying photo-sensitive layer of organic semiconductor onto substrate of non-organic semiconductor and positioning of these between electrodes, one of which is semi-transparent. As non-organic semiconductor, n-type gallium arsenide is utilized (n-GaAs), and as organic semiconductor, thin layer of copper phthalocyanine of p-type is applied, between layer of n-type and layer of p-type, layer of native semiconductor is positioned (i-layer). ^ EFFECT: increased photo-sensitivity in photo-EMF in wave length range 400/500 nanometers. ^ 1 dwg
申请公布号 RU2282272(C1) 申请公布日期 2006.08.20
申请号 RU20050109880 申请日期 2005.04.05
申请人 VOLOGODSKIJ GOSUDARSTVENNYJ TEKHNICHESKIJ UNIVERSITET 发明人 SMIRNOVA OL'GA JUR'EVNA;FEDOROV MIKHAIL IVANOVICH
分类号 H01L31/18 主分类号 H01L31/18
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