| 摘要 |
A method for forming a positive metal pattern that includes the steps of (i) coating a photocatalytic compound on a substrate to form a photocatalytic film, (ii) coating a composition comprising a water-soluble polymer and a Pd compound on the photocatalytic film to form a photosensitive layer, (iii) selectively exposing the photocatalytic film and the photosensitive layer to light to form a latent pattern acting as a nucleus for crystal growth, and (iv) plating the latent pattern to grow a metal crystal thereon. Further disclosed is an electromagnetic interference (EMI) filter comprising a metal pattern formed by the method. According to the method, a high-resolution metal pattern can be formed in a rapid and efficient manner when compared to conventional methods for forming a metal pattern. In addition, since the EMI filter has superior performance and is easy to manufacture at low costs, it can be advantageously applied to flat display panels, including plasma display panels (PDPs).
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