| 摘要 |
PROBLEM TO BE SOLVED: To provide an alignment system for nano-imprint lithography. SOLUTION: The alignment system includes a plurality of electron emission devices 132, which are provided in a mold 130 and emit electrons; and a plurality of electrodes 112, which are provided to face the electron emission devices and at which the electrons emitted from the electron emission devices arrive. A substrate 110 and the mold 130 are aligned with each other by adjusting the positions of the mold and substrate, and the amount of current in the electrode is maximized. COPYRIGHT: (C)2006,JPO&NCIPI
|
