| 摘要 |
<p>A particle-beam projection processing apparatus for irradiating a target by means of a beam of energetic electrically charged particles, comprising an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, further comprising at least one plate electrode means (8), which has openings corresponding to the apertures of the pattern definition system and comprising a composite electrode (281) composed of a number of partial electrodes (830,831) being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement (21) of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.</p> |
