| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a creation method of a template (reference pattern information) capable of coping with the change of the measuring conditions of position measurement. <P>SOLUTION: Firstly, a pattern (an alignment mark and a part of circuit pattern) different in the design rule is selected as a template creation candidate, in a position located on a wafer W so as to perform the search alignment measurement. Subsequently, the lighting conditions (the wavelength of the illumination light, the opening shape of the aperture diaphragm arranged the illumination light-path the number of apertures and the like) which illuminate the pattern are selected/set up. Next, the image signal information on a pattern is taken in under these measuring conditions, and furthermore the taken-in image signal information is evaluated (the processing time when actually performing the position measurement, the measuring accuracy, and the robustness over noise). Then, a template is created based on the image signal information which obtained the predetermined evaluation. Templates are respectively created for every measuring condition by this repetition under each measuring condition. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
