发明名称 METHOD FOR EVALUATING PATTERN SHAPES WITH HIGH ACCURACY, AND APPARATUS THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a method for evaluating edge roughness actually existing in an object to be observed or indexes of roughness in line width, and a roughness component originated from noise contained in a observation result from one sheet of image obtained by normal pattern observation in shorter time than the conventional time, and without decreasing at least a same precision as the conventional method, and to provide an apparatus thereof. SOLUTION: To precisely and quickly evaluate the degree of the edge roughness from a SEM observation image of a micro line pattern with noisy, contribution of random noise originated from a device in indexes of the edge roughness is calculated based on data of one sheet of image. The degree of roughness, actually existing in the pattern, is calculated by subtracting the roughness originated from the device from the measured value of the edge roughness index. Quantity (distributed values), originated from the random noise in fluctuations at edge position statistically reduces to 1/N when N pieces of edge position data, are averaged. The image is averaged by values of various parameters S to one image in the lengthwise direction, by using the feature, and then the index of edge roughness is determined. The S dependence of the index of edge roughness is analyzed, and a term with distributed value proportional to 1/S is originated from noise. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006215020(A) 申请公布日期 2006.08.17
申请号 JP20050343047 申请日期 2005.11.29
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YAMAGUCHI ATSUKO;FUKUDA HIROSHI;KOMURO OSAMU;KAWADA HIROKI
分类号 G01B15/04;G01N23/225;H01L21/66 主分类号 G01B15/04
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