| 摘要 |
An exposure apparatus includes a projection optical system for exposing and transferring a pattern on a mask onto an object, an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in the projection optical system, and for illuminating the mask, and a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source to the object and a light intensity distribution on the secondary light source surface.
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