发明名称 Electronic device including dielectric layer, and a process for forming the electronic device
摘要 A mixture of materials can be used within a layer of an electronic device to improve electrical and physical properties of the layer. In one set of embodiments, the layer can be a dielectric layer, such as a gate dielectric layer or a capacitor dielectric layer. The dielectric layer can include O, and two or more dissimilar metallic elements. In one specific embodiment, two dissimilar elements may have the same single oxidation state and be miscible within each other. In one embodiment, the dielectric layer can include an alloy of (HfO<SUB>2</SUB>)<SUB>(1-x)</SUB>(ZrO<SUB>2</SUB>)<SUB>x</SUB>, wherein x is between 0 and 1. Each of Hf and Zr has a single oxidation state of +4. Other combinations are possible. Improved electrical and physical properties can include better control over grain size, distribution of grain sizes, thickness of the layer across a substrate, improved carrier mobility, threshold voltage stability, or any combination thereof.
申请公布号 US7091568(B2) 申请公布日期 2006.08.15
申请号 US20040023014 申请日期 2004.12.22
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 HEGDE RAMA I.;DEMKOV ALEXANDER A.;TOBIN PHILIP J.;TRIYOSO DINA H.
分类号 H01L29/76;H01L21/8242 主分类号 H01L29/76
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