摘要 |
A surfactant composition consists of a mixture of one or more salts of at least one alkyl benzene sulphonic acid derived from an alkylbenzene having an average molecular weight between 240 and 290, and at least one condensation product of an alkyl phenol with alkylene oxide, of the general formula <FORM:0986049/C4-C5/1> where R is an alkyl chain having 8 to 18 carbon atoms inclusive, the mean of n may vary from 24 to 60 inclusive, and R1 is the ethylene or propylene radical. The cation of the salt is an alkali metal, a Group II metal (except mercury or radium), ammonium or an organic amine, or a mixture thereof, and is preferably the triethanolamine cation. The preferred condensation product is obtained from octyl or nonyl phenol and ethylene oxide. The mixture may contain the anionic and the non-ionic surfactants in a ratio varying between 1 : 1 and 10 : 1. Using these mixtures in aqueous solution concentrations of organic matter up to 60% are obtainable. Examples illustrate the use of mixtures containing triethanolamine derivatives of alkyl benzene sulphonic acids of mean M.W. 240, 246 and 262 (260-270 being preferred), in conjunction with condensates of octyl and nonyl phenol with 30 and 40 molecules of ethylene oxide (30-40 preferred range); the mixtures contain additional triethanolamine for pH adjustment. The Specification disclaims mixtures containing alkylene oxide-alcohol condensates as well as the two specified ingredients. |