| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a developer composition and a developing solution for obtaining a clear defined pattern of a photoresist pattern or a color filter. <P>SOLUTION: The developer composition comprises: (a) an alkali metal carbonate by 0.01 to 20 parts by mass with respect to water of 100 parts by mass; (b) an alkali metal bicarbonate by 0.01 to 20 parts by mass with respect to water of 100 parts by mass; (c) a nonionic surfactant expressed by formula (I) by 0.01 to 25 parts by mass with respect to water of 100 parts by mass; and (d) a nonionic surfactant expressed by formula (II) by 0.01 to 25 parts by mass with respect to water of 100 parts by mass. In formula (I), R<SB>1</SB>represents a hydrogen atom or a methyl group; R<SB>2</SB>represents a hydrogen atom or a methyl group; n is an integer 0 to 10; and m is an integer 4 to 20. In formula (II), R<SB>3</SB>represents a 1-12C alkyl group; p is an integer 0 to 10; and q is an integer 4 to 20. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
