| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material having good scratch resistance in a developer, excellent in resolution and tenting property, excellent also in developability, and realizing formation of an accurate pattern free from variation in line width, a chip and disconnection, and to provide a pattern forming apparatus equipped with the pattern forming material and a pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material comprises a support and at least a photosensitive layer on the support, wherein the photosensitive layer contains at least a binder, a polymerizable compound and a photopolymerization initiator, the binder has an I/O value of 0.35-0.65 and the polymerizable compound contains a compound having three or more polymerizable groups per molecule. Preferably the polymerizable compound contains a compound having three or more polymerizable groups and one polyalkylene oxide group per molecule. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
