MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element (TE; TE2; TE3) that has no refractive power and is designed for dry operation of the projection objective (20; 220; 320). According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element (TE'; TE2'; TE3') that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element (TE'; TE2'; TE3') is replaceable with the dry terminating element (TE; TE2; TE3). Preferably, the dry terminating element (TE; TE2; TE3) and/or the immersion terminating element (TE'; TE2'; TE3') is composed of a plurality of plates (TP1, TP2; TP31', TP32'), which are made of materials having different refractive indices.