发明名称 |
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
摘要 |
An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction. The plurality of projection optical systems and the substrate relatively move during an exposure field forming operation along the scanning direction.
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申请公布号 |
US7088425(B2) |
申请公布日期 |
2006.08.08 |
申请号 |
US20050101553 |
申请日期 |
2005.04.08 |
申请人 |
NIKON CORPORATION |
发明人 |
TANAKA MASASHI;KATO MASAKI |
分类号 |
G02B13/22;G02B17/00;G02B17/06;G02B17/08;G02B27/10;G03F7/20 |
主分类号 |
G02B13/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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