发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A transport unit transfers a substrate between a chamber enclosing a substrate table and a processing unit that process a substrate before and after exposure in a substantially contaminant free environment to minimize the exposure of the resist on the substrate to the contaminants.
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申请公布号 |
US7088421(B2) |
申请公布日期 |
2006.08.08 |
申请号 |
US20030648796 |
申请日期 |
2003.08.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN INGEN SCHENAU KOEN |
分类号 |
G03B27/52;G03B27/42;G03F7/20;H01L21/027;H01L21/677 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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