发明名称 Lithographic apparatus, device manufacturing method, and device manufactured thereby
摘要 A transport unit transfers a substrate between a chamber enclosing a substrate table and a processing unit that process a substrate before and after exposure in a substantially contaminant free environment to minimize the exposure of the resist on the substrate to the contaminants.
申请公布号 US7088421(B2) 申请公布日期 2006.08.08
申请号 US20030648796 申请日期 2003.08.27
申请人 ASML NETHERLANDS B.V. 发明人 VAN INGEN SCHENAU KOEN
分类号 G03B27/52;G03B27/42;G03F7/20;H01L21/027;H01L21/677 主分类号 G03B27/52
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