| 发明名称 |
PHOTORESIST POLYMER COMPOSITIONS |
| 摘要 |
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
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| 申请公布号 |
KR20060088480(A) |
申请公布日期 |
2006.08.04 |
| 申请号 |
KR20057024783 |
申请日期 |
2004.06.25 |
| 申请人 |
JSR CORPORATION |
发明人 |
BENOIT DIDIER;SAFIR ADAM;CHANG HAN TING;CHARMOT DOMINIQUE;NISHIMURA ISAO;SOYANO AKIMASA;OKAMOTO KENJI;WANG YOUG |
| 分类号 |
G03F7/039;C08F20/18;C08F220/18 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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