| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern feature generating system for simultaneously achieving the maximization of an inter-class distribution and the minimization of the in-class distribution. SOLUTION: A pattern detecting device comprises: an input part 10 for inputting an input pattern; a feature quantity extracting part 22 for extracting a feature quantity from the input pattern inputted from the input part 10; a feature pattern holding part 24 for holding the feature pattern of previously registered registration data; a pattern detection performing part 26 for calculating a characteristic vector which minimizes the in-class distribution and maximizes the inter-class distribution, based on the input pattern, comparing the feature extracted by the product sum of the characteristic vector and the input pattern with the feature pattern held in the feature pattern holding part 24, and performing pattern detection; and an output part 30 for outputting the pattern detection result of the pattern detection performing part 26. COPYRIGHT: (C)2006,JPO&NCIPI
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