Method for forming shallow trench isolation of bottom antireflective coating,申请号KR20040114993-传众专利搜索

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发明名称	Method for forming shallow trench isolation of bottom antireflective coating
摘要
申请公布号	KR100609234(B1)	申请公布日期	2006.08.02
申请号	KR20040114993	申请日期	2004.12.29
申请人		发明人
分类号	H01L21/316;H01L21/762	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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