发明名称 Method of fabricating a nonvolatile memory device made of electric resistance material
摘要 <p>A nonvolatile memory device using a resistance material and a method of fabricating the same are provided. The nonvolatile memory device includes a switching element, and a data storage part electrically connected to the switching element. In the data storage part, a lower electrode is connected to the switching element, and an insulating layer is formed on the lower electrode to a predetermined thickness. The insulating layer has a contact hole exposing the lower electrode. A data storage layer is filled in the contact hole and the data storage layer is formed of transition metal oxide. An upper electrode is formed on the insulating layer and the data storage layer.</p>
申请公布号 EP1686624(A1) 申请公布日期 2006.08.02
申请号 EP20050256190 申请日期 2005.10.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG-HYUN, LEE;SUNG-KYU, CHOI;KYU-SIK,KIM
分类号 H01L27/24;H01L45/00 主分类号 H01L27/24
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