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发明名称
METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSIONS OF A MASK DESIGN PATTERN
摘要
申请公布号
KR20060086621(A)
申请公布日期
2006.08.01
申请号
KR20050007479
申请日期
2005.01.27
申请人
ALLIED INTEGRATED PATTERNING CORP.
发明人
HO MING FENG;CHEN HUA JEN
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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