发明名称 MULTILAYERED REFLECTING MIRROR, EUV EXPOSURE SYSTEM AND REMOVAL METHOD FOR CARBON CONTAMINATION ON MULTILAYERED MIRROR
摘要 <P>PROBLEM TO BE SOLVED: To provide a multilayered reflecting mirror capable of efficiently removing carbon contamination deposited on the surface. <P>SOLUTION: A mirror base plate 1 is overlaid with a multilayer film 2 for reflecting coating. The multilayer film 2 is formed so as to partly overlap on a conductive thin film 4 and both are electrically connected. In the vicinity of the surface overlaid with the multilayer film 2 on the mirror base plate 1, a gas discharge mechanism 8 is provided. When oxygen gas is blown against the multilayer film 2 from the gas discharge mechanism 8 and a high-frequency voltage is impressed on the multilayer film 2, oxygen plasma is generated by glow discharge nearby the mirror surface and oxygen ion and oxygen radicals formed in it reach the surface of the multilayer film 2. The carbon contamination, deposited on the multilayer film 2 surface, is oxidized with the oxygen radicals and oxygen ion to be (carbon dioxide) gas and is removed by a vacuum exhaust device connected to a vacuum chamber. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006194690(A) 申请公布日期 2006.07.27
申请号 JP20050005424 申请日期 2005.01.12
申请人 NIKON CORP 发明人 MURAKAMI KATSUHIKO
分类号 G21K1/06;G03F7/20;G21K5/02;H01L21/027 主分类号 G21K1/06
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