| 摘要 |
In apparatus for superresolution microscopy or microlithography, wherein a spot in the specimen to be examined or in the microlithographic medium is raised to an excited state by a first pulse of light, and a second pulse of light reduces the excitation in the peripheral parts of the spot to increase the resolution of the instrument, a method whereby the wavelength of the second pulse in the specimen or medium is the same as the wavelength of the first pulse, thereby allowing the cost and complexity of the apparatus to be lowered. |
