| 摘要 |
PROBLEM TO BE SOLVED: To make reduction in time for photographing images and high image quality photographing compatible in a scanning electron microscope for measurement, inspection, and defect review or the like of semiconductor wafers. SOLUTION: By photographing a low magnification image using a large beam current, and by photographing a high magnification image using a small beam current, control amount for correcting brightness changes, focal deviations, alignment deviations, and view field deviations of photographing caused due to the changes in the beam currents are stored in advance in a memory in the whole control system 118, and by correcting the beam currents whenever these are switched, photographing of the images is enabled without adjustment work after having switched the beam currents. Furthermore, the time for switching the currents is shortened by installing an aperture 801 in the irradiation route of the electron beam. COPYRIGHT: (C)2006,JPO&NCIPI
|
