SYSTEMS, MASKS AND METHODS FOR PRINTING CONTACT HOLES AND OTHER PATTERNS

摘要

Contact hole patterns are disclosed having a plurality of peripheral regions formed around a target area in which a contact hole is to be formed. The peripheral regions visually resemble "lobes" or "leaves" extending outwards towards the periphery of the target area. The lobes may be disjoint or connected to each other. Present methods can be used to prepare masks for printing contact holes on wafers, as well as to prepare design patterns for laser-writers or direct- write lithography in order to print contact holes on masks or directly on wafers. The methods apply to both binary and phase-shift mask designs with varying illuminations.