| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid immersion lithography equipment, where temperature gradient in the immersion liquid is reduced or avoided. <P>SOLUTION: The liquid immersion lithography equipment, where one or a plurality of liquid flow divider is located in a space enclosed by a liquid closing structure, is disclosed. The function of the liquid flow divider is to prevent the formation of one or a plurality of recirculating zones which may cause, not only the variation of refractive index of the immersion liquid in a space but also the image error. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
