发明名称 PREDICTION METHOD FOR LIFE OF METAL INSULATOR SEMICONDUCTOR FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To exactly predict the life of a high dielectric constant semiconductor device. SOLUTION: A test method for MISFET for determining the effect of hot carrier injection in an integrated circuit lifetime is provided. In this method, positive load voltage is impressed to a gate having a high dielectric constant during maintaining a drain voltage at an equal value to the load voltage. The use of larger load voltage than a usual operation voltage accelerates failure and degradation of the integrated circuit. Electric parameters such as a threshold voltage, a transformer conductance, a linear drain current, a saturation drain current are observed. The shifts in the observed electric parameters show device failures. By plotting the logarithm of accelerated device life against the gate load voltage, data analysis is performed. The device life under the operating conditions are predicted by estimating on the basis of the plot concerning a specific device operation voltage. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006194875(A) 申请公布日期 2006.07.27
申请号 JP20050374490 申请日期 2005.12.27
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD 发明人 TSAI CHING-WEI;WANG CHIH-HAO;KI MEIKA
分类号 G01R31/26;H01L21/822;H01L27/04;H01L29/78 主分类号 G01R31/26
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