| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a coating film on a photo resist without causing intermixing with the photo resist film, wherein the coating film can be kept stable without dissolving into a medium upon exposure to a light under liquid-impregnation, and it is possible to produce a top-coating film having a large contact angle such as 70°or more for the liquid-impregnation medium and showing high solubility in an alkaline developing liquid without degradation in a pattern form in a case where a dry exposure to a light is conducted in place of liquid-impregnation exposure to a light. <P>SOLUTION: A copolymer for forming a top-coating film to be applied on a photo resist film exposed to a light under liquid-impregnation contains a repeating unit containing a carboxylic group in an amount of 20-60 mol% relative to the total repeating unit, has a weight average molecular weight of 2,000-100,000 as measured by the gel permeation chromatography method, and can be produced by the copolymerization of a (meth)acrylic acid ester containing a side chain having a fluorine atom and further by the copolymerization of a (meth)acrylic acid alkyl ester containing a hydroxy group. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
