发明名称 DOPANT SOURCE FOR FLUORINE-DOPED QUARTZ PREFORM, FEED PIPE AND INNER SURFACE TREATING METHOD AND METHOD OF MANUFACTURING FLUORINE-DOPED QUARTZ PREFORM
摘要 PROBLEM TO BE SOLVED: To provide a dopant source for a fluorine-doped quartz preform which is capable of remarkably decreasing moisture or impurities in a fluorine-based gas atmosphere for doping fluorine into a porous quartz preform, a pipe for supplying and an inner surface treating method and a method of manufacturing the fluorine-doped quartz preform. SOLUTION: The dopant source for the fluorine-doped quartz preform is filled in a bomb. The bomb to be filled with a fluorine-based gas used as the dopant source for the fluorine-doped quartz preform is previously inner-surface-treated with activated fluorine. The feed pipe to pass the dopant source for the fluorine-doped quartz preform is also previously inner-surface-treated with activated fluorine. The inner surface treating method is for previously treating the inner surface of the bomb to be filled with the dopant source for the fluorine-doped quartz preform and the feed pipe with activated fluorine. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006193372(A) 申请公布日期 2006.07.27
申请号 JP20050006446 申请日期 2005.01.13
申请人 SHIN ETSU CHEM CO LTD 发明人 ABE ATSUSHI;SAITO FUMIO
分类号 C03B37/014;C03B8/04;G02B6/00 主分类号 C03B37/014
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