METHOD OF DETERMINATION OF NANOMETRIC RELIEF OF SUBSTRATE

摘要

FIELD: determination of nano-range relief of substrate. ^ SUBSTANCE: substrate is made of dielectric or semiconductor material. Basic probe is installed at angle of 55-65° to substrate. Additional probe is introduced and installed at angle of 55-65° to substrate and at angle of 55-65° to basic probe. Additional and basic probes are fastened at independent additional piezoelectric drives connected with main one. Distance between points of main and additional probes is adjusted till achieving tunnel gas. Current is measured in probe circuit between main and additional probes. ^ EFFECT: improved precision. ^ 1 dwg