发明名称 Substrate inspection apparatus, substrate inspection method, method of manufacturing semiconductor device and recording medium
摘要 A substrate inspection apparatus includes a first waveform measurer which acquires a first amplitude waveform that is the amplitude waveform of an AC voltage obtained from a semiconductor of a semiconductor substrate which is being inspected when an external AC power source is connected to the semiconductor and an AC voltage from the AC power source is applied to the semiconductor, the semiconductor substrate also having an interconnection that is supposed to be connected to the semiconductor; a second waveform measurer which is connectable to the interconnection of the semiconductor substrate and acquires a second amplitude waveform that is the amplitude waveform of a voltage in the interconnection when the AC voltage is applied to the semiconductor; and an evaluator which calculates the phase difference between the first amplitude waveform and the second amplitude waveform and extracts information on a defect of the semiconductor substrate on the basis of the thus-calculated phase difference.
申请公布号 US7081756(B2) 申请公布日期 2006.07.25
申请号 US20040933440 申请日期 2004.09.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HAYASHI HIROYUKI;YAMAZAKI YUICHIRO
分类号 G01R31/02;G01R31/08;G01N27/00;G01R31/26;G01R31/28;G01R31/302;G01R31/307;H01L21/66 主分类号 G01R31/02
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