发明名称 |
Elementary plasma source and plasma generation apparatus using the same |
摘要 |
An elementary plasma source for generating plasma is provided. In the elementary plasma source, first and second magnets are shaped like a hollow cylinder, and the second magnet surrounds the first magnet, for forming a magnetic trap between the first and second magnets. A guide provides microwaves to a space between the first and second magnets.
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申请公布号 |
US7081710(B2) |
申请公布日期 |
2006.07.25 |
申请号 |
US20040844804 |
申请日期 |
2004.05.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PETRIN ANDREI-B.;SHIN JAI-KWANG;OH JAE-JOON;KIM SEONG-GU;HUR JI-HYUN |
分类号 |
H01J7/24;H05H1/16;H01J37/32;H05H1/18 |
主分类号 |
H01J7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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