发明名称 Elementary plasma source and plasma generation apparatus using the same
摘要 An elementary plasma source for generating plasma is provided. In the elementary plasma source, first and second magnets are shaped like a hollow cylinder, and the second magnet surrounds the first magnet, for forming a magnetic trap between the first and second magnets. A guide provides microwaves to a space between the first and second magnets.
申请公布号 US7081710(B2) 申请公布日期 2006.07.25
申请号 US20040844804 申请日期 2004.05.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PETRIN ANDREI-B.;SHIN JAI-KWANG;OH JAE-JOON;KIM SEONG-GU;HUR JI-HYUN
分类号 H01J7/24;H05H1/16;H01J37/32;H05H1/18 主分类号 H01J7/24
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