| 摘要 |
<p>This invention is to provide a substrate processing apparatus which contributes to reduction of costs for equipment by reducing a floor surface required for installation and carrying a board in an inclined posture by a simple mechanism. After the board is treated by a first treatment part 20, a carrying direction changing part 40 changes the carrying direction of the substrate, and its inclined carrying part 49 carries the substrate to a second carrying path 43 nearly keeping the inclined posture made by the inclination of the first carrying path 41. A liquid supplying part supplies a treatment liquid to the main surface of the substrate B carried by the inclined carrying part 49. The second carrying path 43 and a second treatment part 30 treats the substrate whose inclined posture is kept by the inclined carrying part 49, by carrying the substrate in a direction reverse to the first treatment part 20 without changing the posture.</p> |
