| 摘要 |
<P>PROBLEM TO BE SOLVED: To properly contain a gas for preventing oxidation, by making the member of a mask stage of a stepper light in weight and of high rigidity for preventing generation of a gap between the substrate and the mask stage. <P>SOLUTION: The mask stage to be mounted on the stepper for transferring a fine pattern on the resist of a substrate by photolithography for holding the gas for preventing the resist of the substrate from oxidation is characterized, by forming with ceramics-metal composite material and by forming a compacted film over the surface of the ceramics-metal composite. The reinforcing material of the ceramics-metal composite is SiC, the metal matrix is an Al alloy, and the rate of content of the ceramics reinforcing material is preferably 40-80 vol.%. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
