| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. <P>SOLUTION: A final element in an immersion lithographic apparatus is disclosed. The final element has, on a surface closest to a substrate, a layer bonded to the surface, and comprises an edge barrier which is made of the same material as that of the layer and extends from the layer so as to be away from the substrate for shielding the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or the edge barrier, which can be made of a material having a thermal expansion coefficient smaller than that of the final element. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
