发明名称 Method for determining surface of recesses arranged in carrier substrate involves baking carrier substrate in chamber and evacuating chamber, in order to produce and make around an essentially degassed total surface of carrier substrate
摘要 <p>The method involves baking carrier substrate (2) in chamber (5) and evacuating chamber, in order to produce and make around complete surface of carrier substrate and chamber essentially degassed and make vacuum available in chamber. Given quantity of inert gas is supplied which exceeds total surface of chamber and carrier substrate, completely covering saturation quantity of gas. Pressure value of chamber is determined and on the basis of pressure value, surface of recesses (3) arranged in carrier substrate is assigned. An independent claim is also included for the application of the method.</p>
申请公布号 DE102005000688(A1) 申请公布日期 2006.07.20
申请号 DE20051000688 申请日期 2005.01.04
申请人 INFINEON TECHNOLOGIES AG 发明人 WEIGEL, SASCHA;POTH, JOCHEN
分类号 G01B21/28;G01B13/20;H01L21/66 主分类号 G01B21/28
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