| 摘要 |
PROBLEM TO BE SOLVED: To block a misted treatment liquid from residing in a fixed container and from jetting out to the outside of the fixed container to check the deposition of mist to a substrate and an external peripheral apparatus, etc. SOLUTION: The substrate treatment apparatus has a nozzle 70 for supplying a treatment liquid to a substrate G held by a rotatable spin chuck 50, a rotary cup 60 rotatably synchronized with the spin chuck for housing the substrate held by the chuck 50 in a sealed space with a lid 61, and a fixed cup 62 surrounding the rotary cup having a gas inlet hole 62b at the upside and an exhaust hole 81 at the downside. The fixed cup comprises a gas steam control chamber 66 projecting below the rotary cup, connected to a narrow flow passage 65 formed between the rotary cup and the outer wall, a buffer chamber 68 connected to the stream control chamber through an annular slit 67 provided on the bottom of the control chamber, and a discharge hole 69 for discharging liquid separated from gas in the buffer chamber. COPYRIGHT: (C)2006,JPO&NCIPI
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