发明名称 Exposure equipment and control method of the same
摘要 A controller controls a wafer carrier to move from a SMIF-POD to transfer and collect a wafer between a space of a transfer unit through a thermal chamber. The wafer carrier is returned into the SMIF-POD, when the wafer is exposed, to be kept waiting in the SMIF-POD until the wafer completes the exposure.
申请公布号 US2006160268(A1) 申请公布日期 2006.07.20
申请号 US20050117434 申请日期 2005.04.29
申请人 FUJITSU LIMITED 发明人 YAMADA KEIJI
分类号 H01L21/50;H01L23/02 主分类号 H01L21/50
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