发明名称 LITHOGRAPHIC DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method for improving the level of correction that can be achieved with a transmissive deformable lens element in a lithographic device. <P>SOLUTION: The lithographic device has: a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate; and a deformable lens actuator configured to transmit, at a plurality of sub-regions on the deformable lens element independently, a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006191062(A) 申请公布日期 2006.07.20
申请号 JP20050375313 申请日期 2005.12.27
申请人 ASML NETHERLANDS BV 发明人 MARIA VAN DER WIJST MARC W;FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS;LOOPSTRA ERIK ROELOF;RAVENSBERGEN MARIUS
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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