METHOD FOR MANUFACTURING COLOR FILTER

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter having excellent chemical resistance at high throughput capacity and in high yield without heat-treating a colored pattern-formed transparent substrate.

SOLUTION: This method for manufacturing the color filter comprises the steps of: arranging an electron beam-curable composition on a transparent substrate; and irradiating the electron beam-curable composition arranged on the transparent substrate with an electron beam. The exposure dose of the electron beam is 1-100 Mrad. A colored pattern can be formed on the transparent substrate since the electron beam-curable composition is a coloring composition.

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