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发明名称
POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要
申请公布号
KR20060081727(A)
申请公布日期
2006.07.13
申请号
KR20050002114
申请日期
2005.01.10
申请人
DONGJIN SEMICHEM CO., LTD.
发明人
KIM, JUNG WOO;OH, SEUNG KEUN;LEE, JAE WOO;KIM, JAE HYUN
分类号
G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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