发明名称 Method of CVD chamber cleaning
摘要 A method for cleaning a plasma CVD reactor includes, during a cleaning cycle, (i) providing cleaning active species derived from a cleaning gas in the plasma CVD reactor, and (ii) generating a hydrogen plasma in an interior of the plasma CVD reactor to clean the interior of the reactor.
申请公布号 US2006151002(A1) 申请公布日期 2006.07.13
申请号 US20040022083 申请日期 2004.12.22
申请人 KUMAR DEVENDRA 发明人 KUMAR DEVENDRA
分类号 B08B6/00;B08B9/00;H05H1/24 主分类号 B08B6/00
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